ossila"sUVOzoneCleaneriscapableofremovingcontaminationonthesurfaceofsamples,providingyouwithultracleansurfaceswithinminutes.Byusingahigh-powerUVlightsource,ozoneisgenerated-whichthenbreaksdownsurfacecontaminantsintovolatilecompounds.Thesevolatilecompoundsevaporatefromthesurfaceleavingnotrace.Thismethodcanproducenear-atomicallycleansurfaceswithoutcausingdamagetothesample.
Features
TheUVOzoneCleanerhousesahighintensitylowpressuremercuryvapourdischargelamp.Byutilizingtheemissionat185nmand254nmozonecanbegenerated.ThepresenceofozoneandUVlightallowfortheremovaloforganicsandsterilizesthesurface.
LargeCleaningArea
TheIlluminationareais100mmby100mmthisallowsforthecleaningofawidearrayofsamplesincluding:
MicroscopeSlides4-InchWaferAFMTipsDicedSubstratesPetriDishesAndMore
TheBrightdisplayandtactilekeypadprovideasimpleinterface,alongsidetheeasytousesoftwareitonlytakesashorttimetostartcleaningyoursamples.Inadditiontheinbuiltsoftwaremonitorsthetemperatureinsidethesystem,thisallowsyoutomakesuredelicatesamplesdonotoverheat.
AddedSafety
Ossila"sUVOzonecleanerhasbeendesignedwithsafetyinmind.AdheringtoBSEN61010-1:2010standardsalongsideEMC,LowVoltageandRoHSCEdirective.Thesystemprovidesuserswithaddedreassurancethattheequipmenttheyareusinghasbeenbuiltwithbothqualityandsafetyinmind.
Ossilaaimtohelpsimplifyresearchthatiswhywegiveafree2yearwarrantyonourequipment.Inadditionweofferrapiddispatchofitems,freeshippingonmanyorders,anddiscountsforlargepurchases.Ontopofthisweprovideexpertsupport,tutorials,andarangeofinformativeguides.
WhataretheusesofUVOzoneCleaning
UVOzonecleaningseesawiderangeofusesacrossmultipledisciplines,thetwomainusesforthetechniqueareforsurfacecleaningandsurfacetreatment.SurfacecleaningusingUVozonecleaningistypicallydoneasafinalstepinacleaningproceduretoremoveresidualorganicsthatarepresentonthesurfaceofasample.Theprocessresultsinanatomicallycleansurfacefreeformanyorganiccontaminants.
SurfacetreatmentusingUVOzoneisalsoapopularapplicationofthistechnique.DuringthecleaningprocesstheformationofozoneandoxygenrADIcalscanresultinreactionwithwatermoleculespresentintheair.Thisresultsintheformationofhydroxideradicals.Thesevaryshortlivedhighlyreactivespeciescanreactwithbondsonthesurfaceofsubstratesresultingintheformationofhighenergyhydroxidegroups.Thiscanhelpwithpreparationofsamplesbyincreasingthesurfaceenergyofasubstrate.
TherearealsootherapplicationsofUVOzonecleaningsuchassurfacesterilization,UVcuring,UVchemicalreactions,andmuchmore.FormoreinformationonthedifferentapplicationsanddetailedexamplesofhowUVOzonecleaningcanbeusedpleaseseeourapplicationstab
HowdoesUVOzoneCleaningWork?
UVOzonecleaningreliesupontheuseofahigh-intensityUVlightsourcewhichilluminatesthesurfacetobecleanedwithtwospecificwavelengthsoflight.Lowpressuremercuryvapourdischargelampsaretypicallyusedwhichhavetwodominantemissionpeaksat184nmand254nm.Uponirradiationmolecularoxygenpresentwithinairisdissociatedbyradiationbelow200nminlength.Thisresultsintheformationoftworadicalsofoxygen.Theseradicalsgoontoreactwithfurthermolecularoxygenformingmoleculesofozone.
Atthesametimelightat254nmisusedtoexciteorganicspeciespresentonthesurfaceofthesample.Thisprocessincreasesthereactivityofthecontaminantswithozone.Uponreactingthematerialiscleanedfromthesurface.FormoreinformationonthecleaningprocessandalsohowUVozonecleaningcanalterthesurfaceenergyofsubstratepleaseseeourtheorytabonthispage.
Specifications
| UVlamptype | SyntheticQuartzUVGridLamp |
| UVlampdominantwavelengths | 185nmand254nm |
| UVlampdimensions | 100mmx100mm |
| UVlampcurrent | 30mA(constant) |
| 254nmoutputintensity | 20µW/cm2atdistanceof100cm |
| UVlamplifetime | T80(2000hours);8-10yearsofstandarddailyuse |
| Powersupply | Mains220-240VACFusedat1A |
| OptionalAC/ACAdapter | 110V/230V |
| Maxruntime | 59minutes59seconds |
| Safetyfeatures | Safetyinterlock,Hightemperaturewarning,thermalcutout |
| Substratetraysize | 100mmx100mm |
| Maximumrecommendedsubstratesize | 100mmx100mm |
| OverallDimensions | Width204mm Height227mm Depth300mm |
*PleasenotethatthisUVOzoneCleanerdoesNOThaveanintegratedozonefiltrationsystem,andmustthereforebeoperatedinaworkingfumehood.
Datasheets
UVLampSpectrum(Graphofrelativeintensityofemissionspectrum)
UVLampLifetime(Graphofrelativeintensityoveroperationaltimeinhours)
ComplianceDocuments
DeclarationofConformance(LowVoltageDirective,EMCDirective,RoHSDirective,andBSEN61010-1:2010)
UserManual
UserManual
GeneralApplications
UVOzonecleaningisaversatiletechnique,itcanbeappliedtoawidearrayofmaterialstoprovidesurfacecleaningandtreatment.ItcanalsobeusedforavarietyofotherapplicationswhichrequireeitherthepresenceofozoneorUVlight.BelowisalistofcommonmaterialsthatcanbetreatedusingUVozonecleaning:
Quartz/Glass
Silicon/SiliconOxides
Metals(e.gGold,Silver,Steel)
TransparentConductors(ITO,FTO,IZO,AZO)
MetalOxides(e.gAluminiumOxide,TitaniumOxide)
III-VSemiconductors(e.gGalliumArsenide,SiliconNitride)
AFM/STMProbes
OpticalComponents
IfyouwouldliketoknowifyourmaterialissuitableforusewithUVOzonecleaningpleasefeelfreetocontactusatinfo@ossila.com.
UVOzonecleaningisaversatiletechniquenotonlycanitbeusedacrossawidearrayofmaterialsbutitcanalsobeusedtoperformavarietyofdifferenttasks.BelowisalistofsomeofthecommonapplicationsofUVOzonetreatment:
Surfacecleaning
UVcuring
Surfacesterilization
UVchemicalreactions
SurfaceTreatment
Removalofsurfacemonolayers
Oxidationofsurfaces
Micropatterning
ApplicationNotes
RemovalofSurfaceMonolayersandImprovingSurfaceHydrophilicity
InthisapplicationweusedtheUVozonecleanertoremoveasurfacelayerofn-octadecyltrichlorosilane(OTS)toimprovethewettingofwater-basedsolutionsonasiliconsubstrate.OTSisanorganicmoleculewhichisusedinthefabricationoforganicfieldeffecttransistorstoimprovetheelectricalpropertiesofdepositedfilms.OTSconsistsofatrichlorosilanegroupwhichreactswiththenativeoxideofsilicontoformthreesiloxanebondswiththesurface.ThesebondsrepeatacrossthesurfaceofthesiliconsubstrateuntiltheentiresurfaceiscoveredinamonolayerofOTS.Thelonghydrocarbonchainswhicharepresentresultinthesubstratehavingaverylowsurfaceenergy.
Wettingofhighsurfaceenergysolvents,suchaswater,becomeimpossIBLeandthecontactangleofdepositeddropletsarethereforehigh.TheOTStreatedsubstratewasexposedtoUVozoneforapproximately10minutestocleanthesurfaceoftheoctadecanecarbonchains.BelowisanimageofawaterdropletpresentonthesurfaceofanOTStreatedsiliconsubstrateandanimageofadropletaftertreatment.Thetreatmenthasincreasedthesurfaceenergyenoughtoallowcompletewettingofthewaterdropletonthesubstratessurface.
SurfaceTreatmentofPMMASubstratestoReduceContactAngle
PlasticssubstrateshaveverylowsurfaceenergyduetotheabundanceofC-Hbondsandothersimilarlowenergybonds.Coatingthinfilmsfromsolutionsthathavehighsurfacetensionsolventscanbedifficultduetothepoorwettingthatoccurs.Onemethodtoassessthedegreeofwettingistolookatthecontactangleadropletmakesonthesurfaceoftehsusbtrate.Thelwoerthecontactanglethataparticularsovlentmakesthebetterthewettingit.UVozonecleaningcanbeusedtotreatthesurfacetoimprovethewettingofsolvents.
DuringtheprocessofUVozonetreatmentozonereactswithsurfacebondsbreakingdowntheorganicgroupsandeventuallyreleasingvolatilespecies.DuringtheprocessintermediatestepsoccurinwhichlowenergybondssuchastheC-HbondarereplacedwithhigherenergygroupssuchasC-OH.Thebelowfigureshowshowsurfacetreatmentcanbeusedtoimprovethesurfaceenergyofasubstrateandthatthelengthofexposuretoozonecanvarythedegreeofsurfaceenergychange.
HowDoesUVOzoneCleanSamples?
UVozonecleaningisaphoto-sensitizedoxidationprocessinwhichorganicmoleculesintheirexcitedstatechemicallyreactwithozonemoleculesresultinginthecleavingofbondsandthedissociationofmoleculesfromthesurface.TheprocessutilizesahighintensityUVlightsourcewhichhastwodominantemissionpeaksat185nmand254nm.Thesetwowavelengthsareresponsiblefordifferentprocesseswhichultimatelyresultinthecleaningofthesurface.
Figure1.Videoshowingtheprocessofozoneformationandphoto-sensitizedoxidationoforganiccontaminants.
Radiationbelow200nmisstronglyabsorbedbymolecularoxygen,theenergyoftheabsorbedphotonisenoughtobreaktheoxygen-oxygendoublebondresultingintheformationoftwofreeradicalsofoxygen(O•).Thesefreeradicalscansubsequentlyreactwithmolecularoxygenproducingozonemolecules(O3).
UVradiationat254nmisreadilyabsorbedbyorganicspeciesthatarepresentonthesurfaceofmanysubstrates.Theexcitonthatisformedwillbeinahighlyenergeticstate,theenergymayalsobehighenoughforcertainmoleculestomakeorganicradicals.
Theexcitedstatesandorganicradicalspeciespresentonthesurfacereadilyreactwithozonepresentwithintheatmosphereresultingintheformationofvolatilespeciessuchascarbondioxide,water,molecularnitrogen,andshortchainorganiccompounds.Thesevolatilecompoundscaneasilydesorbfromthesurfaceunderatmosphericconditionsresultinginapristinesurface.
HowDoesUVOzoneAlterSurfaceEnergy?
UVOzonetreatmentaltersthesurfaceenergyofsamplesviatwomethods,thefirstoftheseisthroughtheremovaloflowenergycontaminantsfromthesurface.Thesearetypicallyorganicatmosphericcontaminantsthathaveadsorbedontothesurfaceofasubstrate.Thesecondwayisthroughtreatmentofthesurfaceandtheformationofhighenergybondsonthesurfaceofthesamples.
Theremovalofcontaminantsisdoneviathephoto-oxidationprocess,thisprocessresultsinthedesorptionofcontaminantsfromthesurfaceduetothechemicalbreakdownoftheorganicmaterial.Theunderlyingsubstrateistypicallyahigherenergysurfacesuchasaceramicorametalthisresultsinthesurfaceenergyofthesampleincreasingincomparisontowhenitwasuntreated.Thistreatmentdoesnotlastforeverasovertimeorganiccontaminantswillbegintoreabsorbbackontothesurfaceslowlydecreasingthesurfaceenergy.
ThesecondwaythatUVOzonetreatmentworkstoimprovethesurfaceenergyisviatheformationofhydroxylfunctionalgroupsonthesurfaceofthesubstrate.Duringtheirradiationprocesslightat253.7nmcanbreakdownwatermoleculesresultingintheformationofOHandOfreeradicals.HydroxylfreeradicalswilltypicallyreactwithozonepresenttoformwaterandOxygen,howeverwhentheUVdegradationofwateroccursnearthesurfaceofthesamplethehydroxylfreeradicalcanreactwiththesurfaceformingafunctionalgroup.Thisfunctionalgrouphasahighbondingenergyresultinginanincreaseinthesurfaceenergyofmostsurfaces.
Formoreinformationonthetheoryofsurfaceenergyandhowtocalculatesurfaceenergiespleasevisitoursurfaceenergyguidepage.
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Tothebestofourknowledgethetechnicalinformationprovidedhereisaccurate.However,OssilaassumenoliABIlityfortheaccuracyofthisinformation.Thevaluesprovidedherearetypicalatthetimeofmanufactureandmayvaryovertimeandfrombatchtobatch.
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