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当前位置: 首页 > 产品中心 > RIA > Ossila/钙钛矿型前体油墨(用于空气处理)/3 x 10 ml(总共30 ml)/I102
商品详细Ossila/钙钛矿型前体油墨(用于空气处理)/3 x 10 ml(总共30 ml)/I102
Ossila/钙钛矿型前体油墨(用于空气处理)/3 x 10 ml(总共30 ml)/I102
Ossila/钙钛矿型前体油墨(用于空气处理)/3 x 10 ml(总共30 ml)/I102
商品编号: I102
品牌: Ossila inc
市场价: ¥13500.00
美元价: 8100.00
产地: 美国(厂家直采)
公司:
产品分类: RIA放免试剂盒
公司分类: RIA
联系Q Q: 3392242852
电话号码: 4000-520-616
电子邮箱: info@ebiomall.com
商品介绍

I101 perovskite Ink has been specially formulated in the Ossila laboratories to be deposited by spin coating. Our I101 perovskite ink is designed for air processing in low-humidity environments. Using a mixture of methyl ammonium iodide (MAI) and lead chloride (PbCl) dissolved in dimethyl formamide our I101 perovskite ink will convert to a methylammonium lead halide perovskite under heat. The final product is a methylammonium lead iodide perovskite with trace amounts of chlorine given by the formula CH3NH3PbI3-xClx. For information on the various applications of the mixed halide CH3NH3PbI3-xClx perovskite see our applications section.

The main use of CH3NH3PbI3-xClx is in the fabrication of solar cells, our I101 ink can be used in both standard and inverted architectures; and can achieve power conversion efficiency (PCE) values of over 13% (see our device performance section for more information). The ink specifications can be found below along with complete guides on the processing of perovskite inks for standard architecture and inverted architectures. Using our I101 recipe provided, 5ml of solution is capable of processing up to 160 substrates (1,280 devices using our 8-pixel substrate design).

Now selling bulk orders of 30ml with a 25% discount over our standard order sizes.

 

Perovskite Ink

I101 is packaged as 10 individual vials containing 0.5 ml of solution capable of coating up to 160 substrates. I101 can also be bought in bulk (30 ml) with a 25% discount over our standard order sizes.

 

Specifications

 

Perovskite Type

CH3NH3PbI3-xClx

Precursor Materials

Methyl Ammonium Iodide (99.9%), Lead Chloride (99.999%)

Precursor Ratio

3:1

Solvent

Dimethyl Formamide (99.8%)

Optical Bandgap

1.56-1.59eV

Energy Levels

Valence Band Minimum 5.4eV, Conduction Band Minimum 3.9eV

Emission Peak

770-780nm (PL); 755-770nm (EL)

Standard Architecture PCE

13.7% Peak; 13.0% ±0.25% Average

Inverted Architecture PCE

13.1% Peak; 11.9% ±0.50% Average

Processing Conditions

Air processing; low humidity (20% to 35%)

Packaging

10x 0.5ml sealed amber vials; 3 x 10ml sealed amber vials

 

I101 Perovskite Applications

Perovskite Photovoltaics

The single biggest application of perovskite materials is for photovoltaic devices; perovskites fabricated from MAI:PbCl precursors have been used in several papers to achieve high power conversion efficiencies. The advantage of using MAI:PbCl as precursor materials is the ability to process in an ambient environment.

References

  • Efficient hybrid solar cells based on meso-superstructured organometal halide perovskites. J. Snaith et. al. Science. 338 (2012) 643-647 DOI: 10.1126/science.1228604
  • Additive enhanced crystallization of solution-processed perovskite for highly efficient planar- heterojunction solar cells. K-Y. Jen et. al. Adv. Mater. 26 (2014) 3748-3754 DOI: 10.1002/adma.201400231
  • Morphological control for high performance, solution-processed planar heterojunction perovskite solar cells. J. Snaith et. al. 24 (2014) 151-157 DOI: 10.1002/adfm.201302090

 

Perovskite LED and Lasing

Due to the high photoluminescence quantum yield of perovskites at room temperature, the application of these materials in light-emitting diodes (LEDs) is of great interest. Devices made using MAI:PbCl precursors show strong emission in the near-infrared region at 755nm. Additionally, recent work has shown lasing within this material.

References

  • Bright light-emitting diodes based on organometal halide perovskite. R. H. Friend et. al. Nature Nanotechnology, 9 (2014) 687-692 doi:10.1038/nnano.2014.149
  • Interfacial control towards efficient and low-voltage perovskite light-emitting diodes. Hang et. al. Adv. Mater. 27 (2015) 2311-2316 DOI: 10.1002/adma.201405217
  • High photoluminescence efficiency and optically pumped lasing in solution-processed mixed halide perovskite semiconductors. H. Friend et. al. J. Phys. Chem. Lett. 5 (2014)1421-1426 DOI: 10.1021/jz5005285

 

Scale-Up Processing

Due to the ability to process perovskites based upon MAI:PbCl precursors in air, the material opens up the possibility of applications in large-scale deposition techniques. Several different scalable techniques, such as slot-die coating and spray coating have been used to deposit this material.

References

  • Upscaling of perovskite solar cells: Fully ambient roll processing of flexible perovskite solar cells with printed back electrodes. C. Krebs et. al. Adv. Energy Mater. 5 (2015) 1500569 DOI: 10.1002/aenm.201500569
  • Highly efficient, felixble, indium-free perovskite solar cells employing metallic substrates, M. Watson et. al. J. Mater. Chem. A, 3 (2015) 9141-9145 DOI: 10.1039/C5TA01755F
  • Efficient planar heterojunction mixed-halide perovskite solar cells deposited via spray-deposition. G. Lidzey et. al. Energy Environ. Sci. 7 (2014) 2944-2950 DOI: 10.1039/C4EE01546K

 

I101 Perovskite Processing Guides

Standard Architecture:

FTO/TiO2(Compact)/TiO2(Mesoporous)/I101/Spiro-OMeTAD/Au

Below is a condensed summary of our fabrication routine for standard architecture devices using our I101 ink.

 

  1. FTO etching:
  • A complete guide to FTO etching can be found on our FTO product page along with an instructional video
  1. Substrate cleaning:
  • Sonicate FTO for 5 minutes in hot (70°C) DI water with the addition of 1% Hellmanex
  • Dump-rinse twice in boiling DI water
  • Sonicate FTO for 5 minutes in Isopropyl alcohol
  • Dump-rinse twice in boiling DI water
  • Dry FTO using filtered compressed gas
  • Place the FTO into the UV Ozone Cleaner and leave for 10 minutes
  1. Compact TiO2 deposition:
  • Prepare a solution of titanium diisopropoxide bis(acetylacetonate) at a volumetric percentage of 8% in isopropyl alcohol (approximately 20ml will be needed)
  • Mask off the substrates such that only the active area of the devices are exposed
  • Place the substrates onto a hotplate set to 450°C
  • Using a nitrogen/compressed air gun set it to a pressure of 16-18 psi and spray the solution onto the substrates. Leave the solution for 30 seconds to dry, and sinter and repeat the spray process again. Repeat this until you get approximately 40 nm of film, this should take around 10 sprays
  • Cover the substrates loosely with foil and leave to sinter for 30 minutes
  • After sintering remove the substrates from the hotplate, care should be taken as rapid cooling can shatter the substrate
  1. Mesoporous TiO2 deposition:
  • Using a mesoporous paste with a particle size of 18nm and pore size of 30nm, prepare a mesoporous film of approximately 200 nm thick
  • Place the substrates back on the hotplate, loosely cover with foil and sinter the substrates at 450°C for 1 hour
  • After sintering remove the substrates from the hotplate, care should be taken as rapid cooling can shatter the substrate
  1. Perovskite deposition (in air):
  • Heat I101 ink for at least 2 hours at 70°C to allow for complete redissolution of solutes
  • Allow I101 ink to cool to room temperature before deposition
  • Set the hotplate temperature to 90°C
  • Static spin coating: place substrate into spin coater, dispense 30-50 μl and start spinning at 2000 rpm for 30 s
  • Place substrate onto the hotplate and anneal for 120 minutes
  • After annealing, transfer the substrates into a glove box environment.
  1. Spiro-OMeTAD deposition (in air):
  • Prepare the following solutions; Spiro-OMeTAD at a concentration of 97 mg/ml in chlorobenzene, Li-TFSI at a concentration of 175 mg/ml in acetonitrile, and TBP at a volumetric percentage of 46.6% in acetonitrile
  • Combine 1000 μl Spiro-OMeTAD, 30.2 μl Li-TFSI, and 9.7 μl TBP solutions
  • Dispense 50 µl of the combined solution onto the perovskite, allowing it to spread across the substrate
  • Spin at 2000 rpm for 30 seconds
  • Use a high-precision mirco cleaning swab soaked in chlorobenzene to wipe the cathode strip clean
  1. Spiro-OMeTAD oxidation and anode deposition:
  • Place the substrates inside a desiccator in air and leave the substrates for 12 hours in the dark to allow for oxidation of the spiro-OMeTAD film (The amount of time required for complete oxidation of the spiro-OMeTAD may vary depending upon thickness and environmental conditions. Additional oxidation steps may be needed after deposition of anode)
  • Using thermal evaporation, deposit an 80 nm layer of gold through a shadow mask to define an active area for your device
  • Devices do not need to be encapsulated for measuring performance
  • If encapsulation is desired, the spiro-OMeTAD should be allowed to fully oxidise again before substrates are transferred into the glove box and encapsulated

 

Inverted Architecture:

ITO/PEDOT:PSS/I101/PC70BM/Ca/Al

For a complete step-by-step guide please see our full perovskite solar cells fabrication guide or our instructional video guide below.

Below is a condensed summary of our routine, which is also available to download as a PDF to enable you to print and laminate for use in the clean room.

 

  1. Substrate cleaning:
  • See substrate cleaning section of standard architecture device guide
  1. PEDOT:PSS deposition:
  • Filter PEDOT:PSS using a 0.45 µm PES filter
  • Dispense 35 µl of the filtered PEDOT:PSS solution onto ITO spinning at 6000 rpm for 30s
  • Place substrate onto a hotplate at 120°C
  • After all ITO substrates are coated, reduce the hotplate temperature to 90°C
  1. Perovskite deposition (in air):
  • Heat I101 ink for at least 2 hours at 70°C to allow for complete re-dissolution of solutes
  • Transfer heated substrate onto spin coater, start spinning at 4000 rpm and dispense 30 μl of I101 ink and leave to spin for 30 s
  • Place substrate back onto the hotplate at 90°C for 120 minutes
  • After annealing transfer the substrates into a glove box environment.
  1. PC70BM deposition (in nitrogen glove box):
  • Prepare a solution of PC70BM at 50 mg/ml in chlorobenzene and stir for 3 to 5 hours
  • Transfer perovskite-coated substrates into the glove box
  • Dispense 20 µl of PC70BM solution onto the spinning substrate at 1000 rpm and spin for 30s
  • Use a micro-precision cleaning swab soaked in chlorobenzene to wipe the cathode strip clean
  1. Cathode deposition:
  • Using thermal evaporation, sequentially deposit 5 nm of calcium and 100 nm of aluminium through a shadow mask to define an active area for your device
  • Encapsulate devices using a glass coverslip and encapsulation epoxy
  • Expose to UV radiation (350 nm) for ~5 minutes (times vary depending upon source intensity) to set the epoxy

 

 

Full length fabrication guide detailing all steps necessary for the fabrication and measurement of perovskite solar cells using Ossila I101 Perovskite Precursor Ink.

 

I101 Device Performance

Below is information on photovoltaic devices fabricated using our standard architecture and inverted architecture recipes for I101 inks. All scans were taken after 10 minutes under illumination of an AM1.5 source, using a voltage sweep from -1.2 V to 1.2 V then from 1.2 V to -1.2 V at a rate of 0.2 V.s-1; no bias soaking was performed on devices.

ArchitectureStandardInverted
Sweep DirectionForwardReverseForwardReverse
Power Conversion Efficiency (%)13.513.712.413.1
Short Circuit Current (mA.cm-2)-20.8-20.8-18.8-18.8
Open Circuit Voltage (V)0.880.900.960.96
Fill Factor (%)73736972

 

I101 standard and inverted architecture perovskite solar celll iv curves
JV curve under AM1.5 irradiation for a standard (left, courtesy of Michael Stringer-Wong, University of Sheffield) and inverted (right, courtesy of Alex Barrows, University of Sheffield) device based on Ossila"s I101 ink. Device characteristics were recorded on a reverse sweep.

 

To the best of our knowledge, the technical information provided here is accurate. However, Ossila assume no liability for the accuracy of this information. The values provided here are typical at the time of manufacture and may vary over time and from batch to batch.

    品牌介绍
    关于奥西拉 Ossila由有机电子研究科学家于2009年成立,旨在提供组件,设备和材料,以实现智能,高效的科学研究和发现。十多年来,我们很自豪能向全球80多个国家/地区的1000多个不同机构提供产品。 凭借在开发有机和薄膜LED,光伏和FET方面数十年的学术和工业经验,我们知道建立可靠,高效的器件制造和测试过程需要花费多长时间。因此,我们开发了相关的产品和服务包-使研究人员能够快速启动其有机电子产品开发计划。 奥西拉保证 全球免费送货 合格的订单可免费运送到世界任何地方 快速安全调度 通过安全跟踪的快递服务快速配送库存物品 质量保证 由所有设备的免费两年保修提供支持 清除前期定价 超过30种货币的清晰定价,无隐藏成本 大订单折扣 保存超过订单8% $ 10,300.00和10%以上的订单 $ 12,900.00 专家支持 我们内部的科学家和工程师随时准备为您提供帮助 全球信赖 优质的产品和服务。已经向很多人推荐。 卡尔加里大学Gregory Welch博士 优质产品价格合理的客户友好公司! Shahriar Anwar,亚利桑那州立大学 奥西拉团队 David Lidzey教授-主席 作为谢菲尔德大学的物理学教授,David Lidzey教授领导该大学的电子和光子分子材料研究小组(EPMM)。David在其职业生涯中,曾在学术和技术环境中工作,主要研究领域包括混合有机-无机半导体材料和器件,有机光子器件和结构以及溶液处理的光伏器件。在整个学术生涯中,他撰写了220多篇同行评审论文。 James Kingsley博士-董事总经理 James是Ossila的联合创始人兼董事总经理。他拥有量子力学/纳米技术博士学位,并在有机电子领域拥有超过12年的经验,他在有机光伏制造产能方面的工作导致了Ossila的成立并建立了强大的指导精神:加快科学发现的步伐。James对开发创新的设备以及改善可溶液加工的光伏和混合有机-无机设备新材料的可及性特别感兴趣。 Alastair Buckley博士-技术总监 Alastair是谢菲尔德大学的物理学讲师,专门研究有机电子学和光子学。他还是EPMM研究小组的成员,致力于研究功能有机材料的内在优势并将其应用到一系列光电设备中。Alastair的经验并非仅在学术界获得。他曾领导MicroEmissive Displays的研发团队,因此在OLED显示器方面拥有丰富的技术经验。他还是Elsevier的“有机发光二极管”的编辑和撰稿人。 我们的研究科学家 我们的研究科学家和产品开发人员在材料的合成和加工以及设备的制造和测试方面拥有丰富的经验。奥西拉(Ossila)的愿景是与学术界和工业界的研究人员分享这一经验,并提高他们的研究效率。通过提供无需费力设备制造过程的产品和服务,以及能够进行准确,快速测试的设备,我们就可以使科学家们腾出时间专注于他们最擅长的工作-科学。 客户服务团队 客户服务团队负责奥西拉的客户旅程。从创建和提供报价到采购和库存管理,客户服务团队致力于提供一流的客户服务。客户服务团队成员的日常职责包括处理客户订单和价格查询,回答客户查询,安排包裹运输以及将订单更新通知客户。 合作与伙伴关系 请联系客户服务团队以解决所有疑问,包括有关Ossila产品的技术问题或有关制造和测量过程的建议。 位置及设施 奥西拉(Ossila)设在谢菲尔德阿特克利夫(Attercliffe)的Solpro商业园区。 我们在现场运营一个专门建造的合成化学和设备测试实验室,在这里制造我们所有的高纯度,批次特定的聚合物和其他配方。此外,设备制造集群内的专用薄膜和有机电子测试与分析工具套件也位于谢菲尔德EPSRC国家外延设施的1000级无尘室中。 我们所有的电子设备均在现场制造。